On Wednesday, November 1, the first Optical Metrology Application Technology Seminar, co-hosted by the Korea Institute of Standards and Technology and the Korea Institute of Photonics, and sponsored by MeterLab, was successfully held at Topaz Hall at Spaceshare Seoul Station in Seoul. Despite being the first of its kind, the seminar was well attended by a wide range of companies involved in optical metrology. 

The seminar was organized into three sessions: High Reliability Inspection Metrology Technology, Next Generation Lens Design and Manufacturing Technology, and Industrial Application Technology, with a total of four presentations in each session. 

Figure 1. Introduction of Metrolab

Figure 2. Technical description photo of the meterlab

In the industrial application technology session, Metrolab presented on "Three-dimensional surface topography measurement technology using line spectroscopy." The presentation began with an introduction of Metrolab and its current sensor lineup, followed by a background on the development of the s-Nova-850H line spectrometer, a technical description of the t-Nova-850H thickness and surface topography sensor, and measurement results on various samples. 

This seminar was a successful start to the Optical Metrology Application Technology Seminar, and we look forward to its further development. We look forward to more active exchanges between those involved in the field of photonics, and we will continue to provide reliable measurement sensors to the industry. 

Figure 3. Group photo of the 1st Optical Measurement Application Technology Seminar